Free floating barrier and semiconductor technological system


Application Number: 00106454
Application Date: 2000.04.10
Publication Number: 1319682
Publication Date: 2001.10.31
Priority Information: 2000/1/27 US 09/492,420
International: C23C16/00;C30B25/00;H01L21/205
Applicant(s) Name: Thermal System Ltd., Silicon Valley Group
Address:
Inventor(s) Name: Lawrence Duan Baseromiao;Jay Brain Dedutenier
Patent Agency Code: 11038
Patent Agent: liu zhibeng
Abstract Protective barrier for CVD system includes: frame assembly with a divided end wall and a pair of side wall extending in the frame assembly; a pair of divided injector barrier body settled on the frame assembly for confirming first face between the protective barrier and the injector, and fixing jet orifice for making reagent flow through the protective barrier from injector between the protective barrier; another barrier body settled on the frame and apart from this barrier body for confirming second face of the protective barrier opposite to the first face, and fixing outlet for making reagent flow through the protective barrier between the protective barrier. Each barrier is consisted of single base containing unit frame, porous plate, supercharging chamber and gas transportation device.