Gas distributing system


Application Number: 00108549
Application Date: 2000.05.17
Publication Number: 1274768
Publication Date: 2000.11.29
Priority Information: 2000/1/31 US 09/494,620; 1999/5/17 US 60/134,443
International: C23C16/44;C23C16/453
Applicant(s) Name: Silicon Vally Group Heat System Inc.
Address:
Inventor(s) Name: Laurens D. Baslomiao;Suen K. Johan;Grigowrie M. Stuhmbur
Patent Agency Code: 11038
Patent Agent: wang yonggang
Abstract The present invention provides an apparatus and method for distributing gas to multiple feeds into a chamberto process a substrate. In one embodiment, the system includes a process gas injector for introducing process gas into the chamber 125 and a shield assembly having a number of shield bodies, adjacent to the process gas injector to reduce deposition of process byproducts thereon. Each shield body has a screen and a metering tube with an array of holestherein to deliver shield gas through the screen. Shield gas is supplied to the metering tubes through a number of flowpaths, each having a flow limiter with an orifice sized so that equal flows of shield gas are provided from each of the shield bodies. Preferably, the orifices are also sized so that the flow of shield gas through each metering tube is constant, even if the shield gas is supplied from a supply that varies in pressure or flow.