Ion implanting device and using method thereof


Application Number  00129575 Application Date  2000.09.29
Publication Number  1290029 Publication Date  2001.04.04
Priority Information   1999/9/29 JP 277051/1999  
International
Classification
 H01L21/265  
Applicant(s) Name  NEC Corp.  
Address    
Inventor(s) Name  Matsuda Hiroo  
Patent Agency Code  11219 Patent Agent  mu dejun
AbstractThe present invention provides an ion-implantation apparatus includes a chamber and a pressure controller for maintaining an internal pressure of the chamber at not less than 1E-4 Torr during an ion-implantation process.