Low temp. chemical vapor-phase deposition equipment and method for synthesizing nanometer carbon tube using same


Application Number: 00109269
Application Date: 2000.06.15
Publication Number: 1278021
Publication Date: 2000.12.27
Priority Information: 2000/4/27 KR 22525/2000; 1999/6/18 KR 23046/1999
International: C01B31/02;C23C16/32
Applicant(s) Name: Lee Chul-Chim
Address:
Inventor(s) Name: Lee Chul-Chim;Ryu Chae-Yeong
Patent Agency Code: 72002
Patent Agent: gan ling
Abstract A low-temperature chemical vapor deposition (CVD) apparatus and a method of synthesizing carbon nanotubes using the CVD apparatus. The reaction tube divided into a first region, which is spatially adjacent to the gas inlet portion, and a second region, which is spatially adjacent to the exhaust portion, for synthesizing carbon nanotubes using the gas decomposed in the first region; a first resistance heater installed around the reaction tube, for maintaining the temperature of the first region at a first temperature. The first metal catalyst film is etched with an etching gas to form a number of nano-sized catalytic particles, and a carbon source gas is thermally decomposed using a thermal chemical vapor deposition (CVD) apparatus having a reaction tube divided into first and second regions. Then, carbon nanotubes are synthesized over the catalytic particles.