Method for automatically aligning grid cap to grid foot of T-shaped grid of smeicondctor device

Application Number: 00105221
Application Date: 2000.04.05
Publication Number: 1273434
Publication Date: 2000.11.15
Priority Information:
International: H01L21/027;H01L21/28;H01L21/31
Applicant(s) Name: Inst. No.13 of Electronics, Ministry of Information Industry
Inventor(s) Name: ding Kuizhang;Song Libo;Wang Tongxiang
Patent Agency Code: 13108
Patent Agent: gao timeng
Abstract A technology for preparing T-shaped grid of semiconductor device features that the grid cap is automatically aligned with grid foot. Two-layer photoresist is used. As the difference in etching speeds of two media is big, after the reaction ions are etched, the medium with higher etching speed is removed. The medium with lower etching speed and photoresist constitute a grid window. After one-pass etching and stripping, a T-shaped grid whose cap is automatically aligned with grid foot is obtained. Its advantages include low plate-making accuracy requirement, easy etching and low cost.