Method for measuring position movement and/or distortion resulted from quadrantal deviation and its device

Application Number: 00108275
Application Date: 2000.04.30
Publication Number: 1272621
Publication Date: 2000.11.08
Priority Information: 1999/4/30 JP 123688/99
International: G01B11/24;G03F7/20;H01L21/027
Applicant(s) Name: NEC Corp.
Inventor(s) Name: Saito Hirofumi
Patent Agency Code: 72001
Patent Agent: wu zengyong
Abstract In a distortion measuring method, a mask having at least a first diffraction grating pattern having an array of a plurality of large patterns and a second diffraction grating pattern having arrays of a plurality of micropatterns spaced apart from the first diffraction grating pattern by a predetermined interval is formed. The plurality of micropatterns are arrayed in a direction perpendicular to an array direction of the second diffraction grating pattern at a predetermined pitch. At least the first and second diffraction grating patterns formed on the mask are projected on a photosensitive substrate through a lens. Distortion including a positional shift component of an image point by aberration of the lens is measured by scanning the photosensitive substrate using coherent light having a diffractable wavelength and by measuring an interval between at least the first and second diffraction grating patterns.