Method for monitoring laser focusing

Application Number: 00107445
Application Date: 2000.05.15
Publication Number: 1323996
Publication Date: 2001.11.28
Priority Information:
International: G01M11/02;G02B27/40
Applicant(s) Name: Inst. of Physics, Chinese Academy of Sciences
Address:
Inventor(s) Name: Zhang Jie;Zhao Lizeng;Liang Tianjiao
Patent Agency Code: 00000
Patent Agent:
Abstract A method for monitoring laser focus works as to focus the laser output light beam on the solid target after the beam is extended by the extender. The target potential created by the interactions between the laser and the solid target will be measured by the target potential probe and potential measuring system. The present invention can make quick measurement for the optimum focus position of the laser.