Pattern defect testing method


Application Number: 00108792
Application Date: 2000.06.02
Publication Number: 1276577
Publication Date: 2000.12.13
Priority Information: 1999/6/2 JP 154535/99
International: G01N21/88;G06K9/20;H01L21/66
Applicant(s) Name: Matsushita Electric Industrial Co., Ltd.
Address:
Inventor(s) Name: Wakitani Koichi;Yunokawa Noriaki
Patent Agency Code: 31100
Patent Agent: sun jingguo
Abstract The object of the present invention is to provide a method capable of classifying and accurately detecting various pattern defects. In accordance with the pattern defect detecting method of the present invention, a fine product image is registered first, and an inputted object images is compared with the fine product image. The solution is to compare the fine product image and object image, and detect the patterns in which the fine product image and object image are different for use as a defect pattern. Based on the outline features of the defect pattern, the defect pattern is classified and detected.