Phase-shifting filter for projecting etching imaging

Application Number: 00116190
Application Date: 2000.10.20
Publication Number: 1350193
Publication Date: 2002.05.22
Priority Information:
International: G02B27/46
Applicant(s) Name: Inst. of Photoelectronic Techn, Chinese Academy of Sciences
Inventor(s) Name: Chen Xunan;Luo Xiangang;Yao Hanmin
Patent Agency Code: 51200
Patent Agent: zhang yigong
Abstract The present invention relates to a projection photo-etching image phase-shifting filter equipment, consisting of light source, condenser group, imaging objective and silicon wafer, which is characterized by that on the pupil surface position of projection photo-etching objective a complete transparent phase-shifting filter plate capable of phase-shifting and filtering image light, so that it can ensure that the image light can not be blocked, and can raise image contrast, and can further raise the photo-etching resolution power of short wavelength large-aperture projection iming system, and can greately raise projection image photo-etching resolution power and increase depth of focus.