Positive photoresist composition


Application Number: 00109344
Application Date: 2000.05.30
Publication Number: 1276540
Publication Date: 2000.12.13
Priority Information: 1999/6/3 JP 156398/99
International: G03F7/00
Applicant(s) Name: Sumitomo Chemical Co., Ltd.
Address:
Inventor(s) Name: Hakko Yoshiko;Takeyama Naotate
Patent Agency Code: 11021
Patent Agent: hu jiaoyu
Abstract A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I): wherein X represents CH2 or C(=O), two of R<1>, R<2>, R<3> and R<4> represent a lower alkyl and the rest two represent hydrogen; gives a good profile with a smooth pattern side even on a substrate having a high reflection; and has a wide focus margin and a good sensitivity and resolution.