Surface treatment method and apparatus, vapor deposition material, and rare-earth based permanent magnet


Application Number: 00108341
Application Date: 2000.05.12
Publication Number: 1276440
Publication Date: 2000.12.13
Priority Information: 2000/4/19 JP 117771/2000; 1999/5/14 JP 134998/1999; 1999/5/14 JP 134999/1999
International: C23C14/24;H01F7/02;H01F41/32
Applicant(s) Name: Sumitomo Special Metal Co., Ltd.
Address:
Inventor(s) Name: Nishiuchi Takeshi;Tochishita Yoshiki;Kikui Fumiaki
Patent Agency Code: 11038
Patent Agent: sun zheng
Abstract A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. A surface treating apparatus according to the present invention includes a melting/evaporating source for melting and evaporating a wire-shaped vapor-depositing material containing a vapor deposition controlling gas. The melting/evaporating source and the work retaining member are disposed in a treating chamber of the surface treating chamber. The apparatus further includes a vapor-depositing material supply means.