System and method for lightening corner of mask to become round in production of said mask


Application Number: 00104798
Application Date: 2000.03.29
Publication Number: 1269529
Publication Date: 2000.10.11
Priority Information: 1999/3/29 US 09/280615
International: G03F1/14;H01L21/027
Applicant(s) Name: Infinion Technology North-America Co.
Address:
Inventor(s) Name: E. L. Karpee;W. Beisonbock
Patent Agency Code: 72001
Patent Agent: liang yong
Abstract A method for fabricating mask patterns in accordance with the present invention includes the steps of providing a mask blank (122) for patterning, propagating a laser/electron beam (120) having an elliptical cross-sectional shape onto the mask blank, the elliptical cross-sectional shape having an elongated axis and edges at opposite ends of the elongated axis and positioning the mask blank to write a pattern on the mask blank wherein the positioning includes employing the edges of the elliptical cross-sectional shape of the laser/electron beam to write corners (124) of the pattern. A system is also included.