System for real-time measurement of in-site emission rate of workpiece in working process


Application Number: 00117951
Application Date: 2000.03.29
Publication Number: 1272556
Publication Date: 2000.11.08
Priority Information: 1999/3/29 US 280308
International: G01J5/00;H01L21/66;H01L21/205;H01L21/31
Applicant(s) Name: Eaton Corp.
Address:
Inventor(s) Name: J. P. Herb;A. Sharkey
Patent Agency Code: 72001
Patent Agent: liang yong
Abstract A system (10) and method for determining the reflectivity of a workpiece (W) during processing in a heating chamber (74) of a thermal processing apparatus (22). The system first determines directly the reflectivity of the workpiece outside of the heating chamber (74) of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber (74) of the thermal processing apparatus (22) by correlating the exterior wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.