Tag Archives: exposure

Exposure mask, its manufacturing method and making method of semiconductor device using same

Application Number  00129284 Application Date  2000.09.30 Publication Number  1293449 Publication Date  2001.05.02 Priority Information   1999/9/30 JP 280499/1999   International Classification  G03F1/16;H01L21/027   Applicant(s) Name  K.K. Toshiba   Address     Inventor(s) Name  Esaki Mizusen   Patent Agency Code  11038 Patent Agent  wang sibeng AbstractA mask of certain type has a transparent base and a… Read More »

Exposure device and method optic disc driver and recording and/or reproducing method

Application Number: 00120347Application Date: 2000.07.07Publication Number: 1280360Publication Date: 2001.01.17Priority Information: 1999/7/7 JP 193545/99International: G11B7/08;G11B7/12Applicant(s) Name: Sony Corp.Address: Inventor(s) Name: Imanishi ShingoPatent Agency Code: 31100Patent Agent: wu rongjunAbstract To control the gap length in the near-field area with a high accuracy, the exposure apparatus (10) includes an exposure light source (11) to emit an exposure laser… Read More »

Exposure equipment and exposure method

Application Number: 00122461Application Date: 2000.07.31Publication Number: 1282956Publication Date: 2001.02.07Priority Information: 1999/7/29 JP 214562/99International: G11B7/125;G11B7/135;G11B7/22Applicant(s) Name: Sony Co., Ltd.Address: Inventor(s) Name: Taketa Makoto;Koki Motoihiro;Imanishi ShinsatoruPatent Agency Code: 31100Patent Agent: hong lingAbstract Disclosed an exposure apparatus and an exposure method, for example , a disc master to be used in the preparation of an optical disc is… Read More »

Electronic Beam exposure mask, Exposure method and equipment and method for making semiconductor device

Application Number: 00123809Application Date: 2000.08.18Publication Number: 1285612Publication Date: 2001.02.28Priority Information: 1999/8/19 JP 232358/1999International: G03F7/00;H01L21/027Applicant(s) Name: NEC Corp.Address: Inventor(s) Name: Miyasaka MitsumiPatent Agency Code: 11219Patent Agent: mu dejunAbstract An electron beam exposure mask comprises a main mask and one or more compensation masks. The main mask has a plurality of first defined masks. The compensation mask… Read More »

Two-side exposure system

Application Number: 00108316Application Date: 2000.03.24Publication Number: 1315677Publication Date: 2001.10.03Priority Information: International: G03F7/20;H05K3/00Applicant(s) Name: Toyokata Industry Co., Ltd.Address: Inventor(s) Name: Okamoto AtsushiPatent Agency Code: 72001Patent Agent: ye kaidongAbstract A dual-side exposure system has the first holder to hold the substrate opposite to the exposure mask for exposing the first surface of said substrate via the the… Read More »

Exposure method and device thereof

Application Number: 00108262Application Date: 2000.04.26Publication Number: 1281165Publication Date: 2001.01.24Priority Information: 1999/7/14 JP 200642/99International: G03F7/20;G03F9/00;H01J9/14Applicant(s) Name: Toshiba K.K.Address: Inventor(s) Name: Yamazaki Tatsuya;Senka Tatsuhiko;Taketa KinPatent Agency Code: 31100Patent Agent: huang yiwenAbstract Provided is exposure method and device thereof to prevent lowering of efficiency and the precision is guaranteed. In the case the deviation is equal to or… Read More »

Electronic beam exposure method

Application Number: 00107637Application Date: 2000.05.25Publication Number: 1274870Publication Date: 2000.11.29Priority Information: 1999/5/25 JP 145579/99International: G03F7/20;H01L21/027Applicant(s) Name: NEC Corp.Address: Inventor(s) Name: Ohinata HideoPatent Agency Code: 11219Patent Agent: mu dejunAbstract In an electron beam exposing method to be used for the manufacture of a semiconductor device, the fluctuation of the pattern dimension of the central part of a… Read More »

Mask used in electron beam exposure and manufacturing method and manufacturing method of semi-conductor device

Application Number: 00106190Application Date: 2000.04.28Publication Number: 1271870Publication Date: 2000.11.01Priority Information: 1999/4/28 JP 123059/99International: G03F1/16;H01L21/027Applicant(s) Name: NEC Corp.Address: Inventor(s) Name: Yamashita KoPatent Agency Code: 11219Patent Agent: mu dejunAbstract The invention relates to a manufacturing method of semi-conductor device. A mask material which is the same as that of a wafer to be exposed is prepared, and… Read More »

Electronic camera and its exposure method

Application Number: 00105883Application Date: 2000.04.14Publication Number: 1318939Publication Date: 2001.10.24Priority Information: International: H04N5/225;G03B7/00Applicant(s) Name: Yilin Science &. Technology Co., Ltd.Address: Inventor(s) Name: Ni Yang;Xie Junxing;Zhang LishanPatent Agency Code: 11127Patent Agent: li qiangAbstract The electronic camera includes an image sensing unit, a lens unit and a control unit. Under the control of the control unit, the image… Read More »