Topcoating composition and method for forming fine pattern using said composition


Application Number: 00109361
Application Date: 2000.05.30
Publication Number: 1276541
Publication Date: 2000.12.13
Priority Information: 1999/6/3 KR 20538/99
International: G03F7/00;G03F7/09
Applicant(s) Name: Hyundai Electronics Industries Co., Ltd.
Address:
Inventor(s) Name: Jeong Chae-Chang;Kong Keun-Kyu;Kim Hyung-Soo
Patent Agency Code: 11219
Patent Agent: mu dejun
Abstract The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present invention comprises an amine contamination-protecting compound. The amine contamination-protecting top-coating composition of the present invention reduces or eliminates problems such as T-topping due to a post exposure delay effect and/or difficulties in forming a fine pattern below 100 nm due to acid diffusion associated with conventional lithography processes.