Two-side exposure system


Application Number: 00108316
Application Date: 2000.03.24
Publication Number: 1315677
Publication Date: 2001.10.03
Priority Information:
International: G03F7/20;H05K3/00
Applicant(s) Name: Toyokata Industry Co., Ltd.
Address:
Inventor(s) Name: Okamoto Atsushi
Patent Agency Code: 72001
Patent Agent: ye kaidong
Abstract A dual-side exposure system has the first holder to hold the substrate opposite to the exposure mask for exposing the first surface of said substrate via the the mask, and the second holder to hold the substrate opposite to another exposure mask for exposing the second surface of said substrate via the another mask. Its advantage is no waiting time in exposing operation.