Tag Archives: maaufacture

Method for electronic beam exposing and method for maaufacture of semiconductor device

Application Number: 00121269Application Date: 2000.08.11Publication Number: 1284740Publication Date: 2001.02.21Priority Information: 1999/8/13 JP 229263/1999International: G03F7/20;H01L21/027;H01L21/30Applicant(s) Name: NEC Corp.Address: Inventor(s) Name: Tokunage KenichiPatent Agency Code: 11021Patent Agent: zhu haibeiAbstract An electron beam exposure method, when the detached conductive parts are formed in the enclosed region composed of conductive parts using the electron beam exposure, it can not… Read More »