Tag Archives: micron

Projection objective for 0.35 micron photoetching

Application Number: 00109948Application Date: 2000.07.26Publication Number: 1335525Publication Date: 2002.02.13Priority Information: International: G02B11/34;G02B13/22Applicant(s) Name: Inst. of Photoelectronics Technology, Academia SinicaAddress: Inventor(s) Name: Chen Xunan;Yao Hanmin;Lin WumeiPatent Agency Code: 51001Patent Agent: zhang yigongAbstract The projection objective for 0.35 micron photoetching is used in stepped repetition projection photoetching machine for manufacture of large scale ICs. It consists of… Read More »