Process for preparing surface layer or thin-wall parts of amorphous tantalum oxide

Application Number: 00118582Application Date: 2000.07.07Publication Number: 1281060Publication Date: 2001.01.24Priority Information: International: C23C28/00Applicant(s) Name: Inst of Applied Physics, Jiangxi-Prov Academy of SciencesAddress: Inventor(s) Name: Zhang Deyuan;Lu Deping;Li FangPatent Agency Code: 36100Patent Agent: zhang wenAbstract A process for preparing the surface layer or thin-wall element of amorphous tantalum oxide includes such steps as generating the surface layer Read more

Low resistivity tantalum

Application Number: 00119910Application Date: 2000.06.30Publication Number: 1290940Publication Date: 2001.04.11Priority Information: 1999/7/2 US 09/347,221International: H01B1/02;H01L21/3205;H01L21/768;H01L23/532Applicant(s) Name: International Business Machine Corp.Address: Inventor(s) Name: E.C. Coony;III;C.E. WuzoPatent Agency Code: 11038Patent Agent: duan chengenAbstract An alpha-phase tantalum having a resistivity of about 15 micro-ohm-cm or less is provided and is especially useful as a barrier layer for copper and Read more